AS 300_Spin Rinse Dryer
- Feature
# 8¡±-12¡± Wafer Dryer
# High Rotation Stability
- Application
# Wafer Clean & Wafer Dryer
- Model Description
Model | Items | Type |
---|---|---|
AS 300 | Motion | Rotation |
Wafer Size | 8¡±-12¡± | |
N2 & D.I.W | Blowing | |
Wafer Load | Manual | |
Control | PC Base |