• Wafer Polishing Service (4",6",8",12")

    - BLANKET WAFER
    - PATTERN WAFER
    - THICKNESS MEASURE


    - Description
    Stage Size 300mm x 300mm
    Measurement Range 100Å~ 35㎛(Depends on Film Type)
    Spot size 40㎛/20㎛,4㎛(option)
    Measurement Speed 1~2 sec./site (fitting time)
    Application Areas All Capability of ST2000 & More Precision Measurement
    Intended for Large Size Wafer Measure
    Option Reference sample(K-MAC or KRISS or NIST)
    Anti-vibration table
    Revolving nosepiece Quintuple Revolving Nosepiecs
    Focus Coaxial Coarse and Fine Focus Controls
    Incident illumination 12v 100W Halogen Lamp



    Sheet resistance measurement
    - Measuring method : Contacted by four point probe
    - Measuring range : 1 mohm/sq ∼ 2 Mohm/sq
    Resistivity measurement
    - Measuring method : Contacted by 4-point probe (input thickness)
    - Measuring range : 10.0 μohm·cm ∼ 200.0 kohm·cm