Wafer Polishing Service (4",6",8",12")

- Description

	Stage Size	300mm x 300mm
	Measurement Range	100Å~ 35㎛(Depends on Film Type)
	Spot size	40㎛/20㎛,4㎛(option)
	Measurement Speed	1~2 sec./site (fitting time)
	Application Areas	All Capability of ST2000 & More Precision Measurement
		Intended for Large Size Wafer Measure
	Option	Reference sample(K-MAC or KRISS or NIST)
		Anti-vibration table
	Revolving nosepiece	Quintuple Revolving Nosepiecs
	Focus	Coaxial Coarse and Fine Focus Controls
	Incident illumination	12v 100W Halogen Lamp

Sheet resistance measurement
- Measuring method : Contacted by four point probe
- Measuring range : 1 mohm/sq ∼ 2 Mohm/sq
Resistivity measurement
- Measuring method : Contacted by 4-point probe (input thickness)
- Measuring range : 10.0 μohm·cm ∼ 200.0 kohm·cm