4” 6” 8” 12” Wafer Polishing ServiceOxide, Metal, SiC Process available
- – BLANKET WAFER
- – PATTERN WAFER
- – THICKNESS MEASURE
- Description
ST5030-SLOxide Measurement Tool
|
Stage Size | 300mm x 300mm |
| Measurement Range | 100Å~ 35㎛(Depends on Film Type) | |
| Spot size | 40㎛/20㎛,4㎛(option) | |
| Measurement Speed | 1~2 sec./site (fitting time) | |
| Application Areas | All Capability of ST2000 & More Precision Measurement | |
| Intended for Large Size Wafer Measure | ||
| Option | Reference sample(K-MAC or KRISS or NIST) | |
| Anti-vibration table | ||
| Revolving nosepiece | Quintuple Revolving Nosepiecs | |
| Focus | Coaxial Coarse and Fine Focus Controls | |
| Incident illumination | 12v 100W Halogen Lamp |
CMT-SR5000Metal Thicknessment Tool
- Sheet resistance measurement
- – Measuring method : Contacted by four point probe
- – Measuring range : 1 mohm/sq ∼ 2 Mohm/sq
- Resistivity measurement
- – Measuring method : Contacted by 4-point probe (input thickness)
- – Measuring range : 10.0 μohm·cm ∼ 200.0 kohm·cm