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Stand-alone Cleaner

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Stand-alone Cleaner

SCS-300

AS-300

ScS-300

Automatic 300mm Post Cleaner.

Process Performance

Automatic wafer handling
High-speed rotation wafer & brush(600 rpm) Double side brush clean
Optimized for wafer cleaning
Upper, Lower brush chemical control

Hardware Performance

Brush fine gap adjustment
FFU filter
Stable wafer movement

Model Description

Model	UNIT	Items	Type
ScS 300™	EFEM	Robot	4-axis
	EFEM	2Foup	Auto Mapping
	Input	High Pressure	Vertical
	Transfer	Robot	3-axis
	Cleaner#1,#2	Chemical Use	HF,NH4OH,SC1
	Cleaner#1,#2	Brush Clean	Double Side Scrubbing
	SRD	Scanning Nozzle	D.I.Water
	SRD	Motion	Rotation