AS-300
200, 300mm Single Wafer Dryer
Process Performance
- 8”, 12” Wafer spin rinse dryer
- Laboratory-optimized dryer system
- DI water, N2 purge
- Recipe generation is possible
| Model | Items | Type |
|---|---|---|
| AS 300 | Motion | Rotation |
| Wafer Size | 8”-12” | |
| N2 & D.I.W | Blowing | |
| Wafer Load | Manual | |
| Control | PC Base |